Horizontal Handle Breeze 12″
Non-contact handling of 300mm wafers using the Bernoulli effect to lift and hold the wafer. Corral pins are located on the side to keep the wafer centered on the wand. Requires CDA or Nitrogen source. Depending on substrate size and weight 10-20 PSI and 1-2 SCFM is required.
|Dimensions||19" x 10" x 5"|
|Shipping Weight||6 lbs|
|Dimensions||20 × 11 × 10 in|
The Breeze wand is non-contact 300mm wafer handling wand that employees the Bernoulli principle to lift and hold the substrate securely without touching it. Four “corral” pins keep the substrate centered on the wand. Ideally suited for wafers with etched cavities or Taiko wafers. The horizontal Breeze is ideal for removing substrates from a platen or cassette from the top down unloading.
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