H-SQUARE manufactures an extraordinary number of different types of vacuum tips for many different sizes, shapes, weights and materials of
wafers, substrates, dies and packages and applications/equipment, as well as for a complete range of temperature and chemical environments.
An in-house (installed to house vacuum) vacuum wand sets are comprised of four parts - vacuum tip,  wand handle, coiled vacuum cord and
wand holder.  Below are the most up-to-date sets for these applications. These sets incorporate our newest products and materials. They are
ESD protected to ensure wafer and component safety while eliminating particle attraction due to static changes. Wands are made from chemical
resistant conductive PVDF.

COMPLETE SETUP = WAND HANDLE + WAND TIP + WAND HOLDER + COIL CORD

T693PKAS3
Material: injection molded antistatic PEEK
General usage, 50mm - 100mm
Recommended vacuum wand: NOASPF2
Also available in bent angles up/down

T693PKAS3-001
Material: injection molded antistatic PEEK
Thin Wafer / Compound Semiconductor
materials 125mm-200mm
Recommended vacuum wand: NOASPF2
Also available in bent angles up/down

T694PKAS
Material: injection molded antistatic PEEK
General usage 100mm-150mm
Recommended vacuum wand: NOASPF2
Also available in bent angles up/down

T794PKAS
Material: injection molded antistatic PEEK
Thin Wafer / Compound Semiconductor
materials, 100mm-150mm
Recommended vacuum wand: NOASPF2
Also available in bent angles up/down

T792PKAS
Material: injection molded antistatic PEEK
Thin wafer / Compound Semiconductor
materials, 125mm-150mm
Recommended vacuum wand: NOASQ2
Also available in bent angles up/down

T696PK
Material: injection molded antistatic PEEK
with UHMW PE contact pad
For wafer manufacturing and sapphire
wafer handling, 125mm-200mm
Recommended vacuum wand: NOASPF2
Also available in bent angle up/down

T692PKAS
Material: injection molded antistatic PEEK
For general wafer handling
125mm-150mm
Recommended vacuum wand: NOASPF2
Also available in bent angles up/down

T100V
Material: machined Vepsel®
For handling wafers perpendicular to
surface of wafer. Available with inset o-rings
on face of tip.
75mm-150mm
Recommended vacuum wand: NOASQ2
Also available in PEEK

T75033QV
Material: Quartz and Vespel®
High temperature application. Features
knife edge spatula facilitates pick up of
wafers from a flat surface, like Epitaxial
reactors and high temperature platens.
Recommended vacuum wand: NOASQ2

T75083PKAS
Material: machined antistatic PEEK
General handling tip
125mm-150mm
Recommended vacuum wand: NOASQ2
Also available in Vespel® and Torlon®

T75055V
Material: machined Vespel®
A knife edged tip for loading/unloading of
wafers from platens and susceptors.
125mm-150mm
Recommended vacuum wand: NOASQ2

T75026V
Material: machined Vespel®
General handling / high temperature
125mm-150mm
Recommended vacuum wand: NOASQ2
Also available in Torlon®
T75028V
Material: machined Vespel®
General handling/ high temperature
125mm-150mm
Recommended vacuum wand: NOASQ2
Also available in PEEK and Torlon®

T75078V
Material: machined Vespel®
High temperature parallel graphite plate
carriers 100mm-150mm
Recommended vacuum wand: NOASQ2

T75010PKAS
Material: machined antistatic PEEK
General usage 75mm-125mm
Recommended vacuum wand: NOASQ2
Also available in Vespel® and Torlon®
Recommended 125mm Vacuum Wand Set
Copyright © 2015 - H-Square Corporation  Santa Clara, California, USA All Rights Reserved
PART NUMBER
DESCRIPTION
MATERIAL
NOASPF2
WAND HANDLE
ESD Safe PVDF
T694PKAS
VACUUM TIP
ESD Safe PEEK
CC11SDS
COIL CORD
ESD Safe Polyurethane
CTA12
ROUND ADP
Stainless Steel
HSU
HOLDER
White Polypropylene
Handling Tools for the Electronics Industry
125mm Handling